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Principles of plasma discharges and materials processing

By: Lieberman, Michael AContributor(s): Lichtenberg, Allan J | -Language: English Series: Publication details: New York ; John Wiley ; 1994Edition: Description: xxvi,572 p; 23.5 cmISBN: 0-471-00577-02Subject(s): - | Plasma dynamics ; Thin films-Surfaces ; Plasma etching ; Plasma chemistry

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Holdings
Item type	Current library	Call number	Status	Notes	Date due	Barcode	Item holds
Books	Central Library, IITB	537.56Lie	Available	G20A15		201538

Total holds: 0

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