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		No cover image available Semiconductor lithography : principles, practices and materials by Moreau, Wayne M \| . Series: Edition: Language: English Publication details: New York ; Plenum Press, ; 1988Availability: Items available for loan: 1 Call number: 621.372:621.382 Mor. Place hold Add to cart (remove)
		No cover image available Polymers for high technology : electronics and photonics : symposium, 192nd meeting, Anaheim, California, Sept 7-12, 1986 / edited by Murrae J. Bowden and s. Richard Turner (acs symposium series ; 346) by American Chemical Society \| . Series: Edition: Language: English Publication details: Washington,DC ; American Chemical Society, ; 1987Availability: Items available for loan: 1 Call number: 678:621.38 Ame. Place hold Add to cart (remove)
		No cover image available Electronic and photonic applications of polymers : 192nd meeting of the American Chemical Society, Anaheim, California, Sept. 7-12, 1986 / edited by Murrae J. Bowden and S. Richard Turner by American Chemical Society \| . Series: Edition: Language: English Publication details: Washington, D.C. ; American Chemical Society, ; 1988Availability: Items available for loan: 1 Call number: 541.64 Ame:192:86. Place hold Add to cart (remove)
		No cover image available Photomasks, scales and gratings by Horne, Douglas F \| . Series: Edition: Language: English Publication details: Bristol ; Adam Hilger, ; 1983Availability: Items available for loan: 1 Call number: 621.383 Hor. Place hold Add to cart (remove)
		No cover image available Photoreactive polymers: the science and technology of resists. by Reiser, Arnost \| . Series: Edition: Language: English Publication details: ; New York, John Wiley, 1 ; 1989Availability: Items available for loan: 1 Call number: 678:621.385.832 Rei. Place hold Add to cart (remove)

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