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Sputtered hafnium dioxide as high-k dielectric for sub 100nm MOSFETs (R)

by Satish Meena | Pinto, R.

Series: Edition: Language: English Publication details: Mumbai ; IIT ; 2009Availability: Items available for reference: Not for loan (1) Call number: 043:621.382.3:537.226Sat.

TCAD simulation for high K germanium devices (R)

by Chakraborty, Debarsi | Ganguly, Swaroop.

Series: Edition: Language: English Publication details: Mumbai ; IIT ; 2011Availability: Items available for reference: Not for loan (1) Call number: 043:621.382.3Cha.

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