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Simulation of the hot wire CVD process of Si:H thin film deposition (R)

by Dinesh Chandra | Dusane, R.O. and Viswanathan, N.N.

Series: Edition: Language: English Publication details: Mumbai ; IIT ; 2004Availability: Items available for reference: Not for loan (1) Call number: 043:669.782:539.23Din.

Themodynamic and kinetic investigation of the HWCVD process (R)

by Adhikari, Subhra | Dusane, R.O. and Viswanathan, N.N.

Series: Edition: Language: English Publication details: Mumbai ; IIT ; 2009Availability: Items available for reference: Not for loan (1) Call number: 043:621.793:536.7Adh.

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