Thermal and plasma nitridation of Si and SiO2 for ultrathin gate insulators of MOS VLSI

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Language: English Series: Publication details: Stanford ; Stanford University, ; 1986Edition: Description: xxxi,374 p; 21 cmISBN:
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Holdings
Item type Current library Call number Status Notes Barcode
Books Books Central Library, IITB 621.382 Mos Available G37A05 139229
Total holds: 0

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