Principles of plasma discharges and materials processing

By: Lieberman, Michael AContributor(s): Lichtenberg, Allan J | -Language: English Series: Publication details: New York ; John Wiley ; 1994Edition: Description: xxvi,572 p; 23.5 cmISBN: 0-471-00577-02Subject(s): - | Plasma dynamics ; Thin films-Surfaces ; Plasma etching ; Plasma chemistry
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Item type Current library Call number Status Notes Date due Barcode Item holds
Books Books Central Library, IITB
537.56Lie Available G20A15 201538
Total holds: 0

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