Gate stack engineering for advanced CMOS high mobility channel materials (R)

By: Kothari, Shraddha [Author]Contributor(s): Lodha, Saurbh [Supervisor] | Indian Institute of Technology Bombay. Department of Electrical EngineeringMaterial type: TextTextLanguage: English Publication details: Mumbai IIT 2018Description: xxiv,122 p 30 cmSubject(s): Theses and Dissertations | Semiconductors -- Materials | Gate array circuits -- Materials | Metal oxide semiconductorsDissertation note: Indian Institute of Technology Bombay. Department of Electrical Engineering Thesis Ph.D. 2018
List(s) this item appears in: Display List 04/03/2019-10/03/2019
Star ratings
    Average rating: 0.0 (0 votes)
Holdings
Item type Current library Call number Status Notes Date due Barcode Item holds
Theses and Dissertations Theses and Dissertations Central Library, IITB
In Process 		043:621.382 Kot Not for loan D03A23 243506
Total holds: 0

Indian Institute of Technology Bombay. Department of Electrical Engineering Thesis Ph.D. 2018

There are no comments on this title.

to post a comment.
Share

Powered by Koha