Bottom-up approaches for nano-scale CMOS scaling (R)
Language: English Publication details: Mumbai IIT 2009Description: ix, 41 p. 30 cmSubject(s): Microelectronics | Metal oxide semiconductors | Complementary | Nanostructured materials | Metal oxide semiconductor field-effect transistorsDissertation note: Thesis Ph.D. Indian Institute of Technology Bombay. Department of Electrical Engineering 2011| Item type | Current library | Call number | Status | Notes | Date due | Barcode | Item holds |
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Theses and Dissertations
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Central Library, IITB Pamphlet Section (Theses, Standards, Reports) | 043:621.382:620.168.3 Kha | Not for loan | D08A29 | 230785 | ||
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Theses and Dissertations
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Central Library, IITB | 043:621.382:620.168.3Roy | Not for loan | D03B28 | 224232 |
Total holds: 0
Thesis Ph.D. Indian Institute of Technology Bombay. Department of Electrical Engineering 2011
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