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Growth and characterization of ultra thin gate dielectrics in N2O ambient (R)

By: Borse, Dileep G [Author]Contributor(s): Chandorkar, A. N [Supervisor] | Indian Institute of Technology Bombay. Department of Electrical Engineering Language: English Publication details: Mumbai IIT 2002Description: xv,163 p. 30 cmSubject(s): Theses and Dissertations | Metal oxide semiconductors | Hot carriers | Dielectric filmsDissertation note: Thesis Ph.D. Indian Institute of Technology Bombay. Department of Electrical Engineering 2002

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Holdings
Item type	Current library	Call number	Status	Notes	Date due	Barcode	Item holds
Theses and Dissertations	Central Library, IITB Pamphlet Section (Theses, Standards, Reports)	043:621.382 Bor	Not for loan	D08A25		198226

Total holds: 0

Thesis
Ph.D.
Indian Institute of Technology Bombay. Department of Electrical Engineering 2002

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