Growth and characterization of low pressure chemical vapor deposited polycrystalline silicon films (R)

By: Rajagopal, RContributor(s): Chandorkar, A.NLanguage: English Series: Publication details: Bombay ; IIT ; 1987Edition: Description: p.47, 28cm; ISBN: 0Subject(s): Chandorkar, A.N | Theses and Dissertations | Thin films
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Holdings
Item type Current library Call number Status Notes Date due Barcode Item holds
Theses and Dissertations Theses and Dissertations Central Library, IITB
043:621.372:621.382Raj Not for loan D06A22 139932
Total holds: 0

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