Normal view
MARC view
Entry Topical Term
001 - CONTROL NUMBER
- control field: 47422
003 - CONTROL NUMBER IDENTIFIER
- control field: OSt
005 - DATE AND TIME OF LATEST TRANSACTION
- control field: 20230429153119.0
008 - FIXED-LENGTH DATA ELEMENTS
- fixed length control field: 230429|| aca||aabn | a|a d
040 ## - CATALOGING SOURCE
- Original cataloging agency: OSt
- Transcribing agency: OSt
150 ## - HEADING--TOPICAL TERM
- Topical term or geographic name entry element: Silicon Dioxide
670 ## - SOURCE DATA FOUND
- Source citation: Work cat.: (OSt)170485: Choksi, Asheesh J. Author 47421, Growth kinetics and electrical properties of silicon dioxide films grown in an inductively coupled RF plasma anodization reactor (R), 1991