Photosensitive metal-organic systems : mechanistic principles and applications : symposium : 202nd national meeting of the American Chemical Society, New York, NY, Aug. 25-30, 1991 / edited by Charles Kutal and Nick Serpone
American Chemical Society
Photosensitive metal-organic systems : mechanistic principles and applications : symposium : 202nd national meeting of the American Chemical Society, New York, NY, Aug. 25-30, 1991 / edited by Charles Kutal and Nick Serpone - - Washington, DC : American Chemical Society, 1993 1993 - xiii,449 p. 23 cm - .
0-8412-2527-36
Organometallic compounds-Congresses
Organic compounds-Congresses
Forcasting-Statistical methods
547.25:541.14 Ame:202:91
Photosensitive metal-organic systems : mechanistic principles and applications : symposium : 202nd national meeting of the American Chemical Society, New York, NY, Aug. 25-30, 1991 / edited by Charles Kutal and Nick Serpone - - Washington, DC : American Chemical Society, 1993 1993 - xiii,449 p. 23 cm - .
0-8412-2527-36
Organometallic compounds-Congresses
Organic compounds-Congresses
Forcasting-Statistical methods
547.25:541.14 Ame:202:91