High performance Ge junctions enabled by Cold/Hot ion implantation for beyond 22nm CMOS (R)

Swarnkar, Prashant

High performance Ge junctions enabled by Cold/Hot ion implantation for beyond 22nm CMOS (R) - - Mumbai IIT 2013 - ix,29 p. 30 cm - .




Lodha, Saurabh
Theses and Dissertations
Metal oxide semiconductors , Complimentary , Metal oxide semiconductor field-effect transistors , Germanium-Electric properties

043:621.382Swa

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