Thermal oxidation of silicon in dry oxygen growth kinetics and charge characterization in the thin regime

Massoud, Hisham Zakaria

Thermal oxidation of silicon in dry oxygen growth kinetics and charge characterization in the thin regime - - n.p. Stanford Univ., 1983 - xx,258 p. 21.5 cm - .

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Silicon oxide films
Metal insulator semiconductors-Congresses
Thin films-Electric properties

621.372:621.382 Mas

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